Suppression of oxidation enhanced boron diffusion in silicon by carbon implantation and characterization of MOSFETs with carbon implanted channels

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 740-744

  Ban, Ibrahim ^a   Oeztuerk, Mehmet C ^a   Demirlioglu, Esin ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CARBON; DIFFUSION IN SOLIDS; OXIDATION; SEMICONDUCTOR DOPING;

OXIDATION ENHANCED DIFFUSION; SHALLOW DOPING;

MOSFET DEVICES;

EID: 0030374644     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)