VIISion 80 and VIISion 200: High current ion implantation systems for greater throughput with excellent performance at low to high doses

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 466-469

  Lundquist, Paul ^a   Pedersen, Bjorn ^a   Ackerman, David ^a   Brown, Douglas ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; PARTICLE OPTICS; PLASMA GUNS; SEMICONDUCTOR DEVICE MANUFACTURE;

LOW ENERGY ION IMPLANTS; WAFER CHARGING PROBLEMS;

ION IMPLANTATION;

EID: 0030372415     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)