Polishability of CERAFORM silicon carbide

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2857, Issue , 1996, Pages 78-85

  Ealey, Mark A ^a   Wellman, John A ^a  

^a Xinetics Inc Ayer MA USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAFORM SILICON CARBIDES; MULTIMODAL DISTRIBUTION; POLISHABILITY;

COSTS; MIRRORS; POLISHING; SILICON CARBIDE; THERMAL EFFECTS;

OPTICAL MATERIALS;

EID: 0030370348     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)