Uniform field emission from polycrystalline CVD-diamond films

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1996, Pages 258-262

  Habermann, T ^a   Goehl, A ^a   Mueller, G ^a   Pupeter, N ^a   Piel, H ^a   Aschermann, B ^a   Raiko, V ^a   Spitzl, R ^a   Engemann, J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELDS; ELECTRON EMISSION; FIELD EMISSION MICROSCOPES; MATHEMATICAL MODELS; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE PROPERTIES;

DIAMOND COATED SILICON MICROSTRUCTURES;

DIAMOND FILMS;

EID: 0030370275     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)