Field emission of nitrogen doped DLC films deposited by PECVD

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1996, Pages 263-267

  Park, Kyu Chang ^a   Moon, Jong Hyun ^a   Kim, Jae Gak ^a   Chung, Suk Jae ^a   Oh, Myung Hwan ^a   Jang, Jin ^a  

^a Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON EMISSION; NITROGEN; PLASMA APPLICATIONS;

FOWLER-NORDHEIM BEHAVIOR; NITROGEN DOPED DIAMOND-LIKE CARBON (DLC) FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

DIAMOND FILMS;

EID: 0030368553     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)