Internal friction of (SiO2)1-x (GeO2)x glasses

Journal De Physique. IV : JP

Volumn 6, Issue 8, 1996, Pages

  Kosugi, T ^a   Kobayashi, H ^b   Kogure, Y ^c  

^a HIROSHIMA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c TEIKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMS; INTERNAL FRICTION; OXIDES; RELAXATION PROCESSES; SILICA;

RELAXATION STRENGTH; THERMALLY ACTIVATED RELAXATION;

GLASS;

EID: 0030364430     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:19968145     Document Type: Article

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