In-situ ion beam profiling by fast scan sampling

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 272-275

  Splinter, P ^a   Sinclair, F ^a   DeMario, N ^a   Reed, W ^a   Castantini, J ^a   Shen, D ^a   Burgess, J ^a   Ring, P ^a   Hirokawa, S ^a  

^a EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CURRENT DENSITY; ION BEAMS; NONLINEAR CONTROL SYSTEMS; SHIELDING;

IN SITU ION BEAM PROFILING;

ION IMPLANTATION;

EID: 0030363829     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)