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Volumn , Issue , 1996, Pages 349-353
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Low temperature reactive ion etching of silicon with SF6/O2 plasmas
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
LOW TEMPERATURE OPERATIONS;
MATHEMATICAL MODELS;
MORPHOLOGY;
NITROGEN;
OXIDES;
REACTIVE ION ETCHING;
SEMICONDUCTING SILICON;
SUBSTRATES;
SULFUR COMPOUNDS;
VACUUM TECHNOLOGY;
SULFUR HEXAFLUORIDE;
PLASMA ETCHING;
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EID: 0030362180
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (8)
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