Medium and high energy phosphorus implants into silicon

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 571-574

  Whalen, P M ^a   Lavine, J P ^a   Zheng, L ^a  

^a EASTMAN KODAK COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL STRUCTURE; MONTE CARLO METHODS; OXIDES; PHOSPHORUS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON;

DEPTH PROFILES;

ION IMPLANTATION;

EID: 0030361785     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)