Ion beam induced deposition of tungsten on silicon

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 717-720

  McLaren, M G ^a   Carter, G ^a   Nobes, M J ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; INERT GASES; ION BEAMS; ORGANOMETALLICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; TUNGSTEN;

INERT ION SPECIES; ION BEAM INDUCED DEPOSITION; THIN TUNGSTEN FILMS;

THIN FILMS;

EID: 0030361090     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)