Relationship between field emission characteristics and hydrogen content in DLC deposited by layer-by-layer technique using PECVD

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

Volumn , Issue , 1996, Pages 268-272

  Park, Kyu Chang ^a   Moon, Jong Hyun ^a   Chung, Suk Jae ^a   Oh, Myung Hwan ^a   Milne, W I ^a   Jang, Jin ^a  

^a Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRON EMISSION; FLUOROCARBONS; HYDROGEN; PLASMA APPLICATIONS;

DIAMOND-LIKE CARBON (DLC) FILMS; LAYER-BY-LAYER DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

DIAMOND FILMS;

EID: 0030359979     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)