Applied materials xRLEAP ion implanter for ultra shallow junction formation

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 470-473

  England, J ^a   Joyce, L ^a   Burgess, C ^a   Moffatt, S ^a   Foad, M ^a   Armour, D ^a   Current, M ^a  

^a Applied Materials   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; PARTICLE OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR JUNCTIONS; TRANSISTORS;

HIGH TRANSMISSION ENERGY RETARDATION OPTICS; LOW ENERGY ION IMPLANTS; ULTRA SHALLOW JUNCTION FORMATION;

ION IMPLANTATION;

EID: 0030359966     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)