Energy values of very low-energy ion beams

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 327-330

  Sakudo, N ^a   Hayashi, K ^a   Yukishiro, Y ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; ION IMPLANTATION; ION SOURCES; PLASMAS; SEMICONDUCTING FILMS; THERMAL EFFECTS;

PLASMA POTENTIAL; SINGLE ELECTRON TEMPERATURE PLASMA;

ION BEAMS;

EID: 0030358655     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)