Carbon implanted in optical grade fused silica: annealing effects in reducing and oxidizing atmospheres

Materials Research Society Symposium - Proceedings

Volumn 438, Issue , 1996, Pages 447-452

  Tung, Y S ^a   Mu, R ^a   Ueda, A ^a   Henderson, D O ^a   Wang, P W ^a   White, C W ^a   Zhu, Jane G ^a   Zuhr, R A ^a  

^a FISK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; CARBON DIOXIDE; CARBON MONOXIDE; CHEMICAL REACTIONS; FUSED SILICA; INFRARED SPECTROSCOPY; MOLECULES;

CARBON DIOXIDE CONCENTRATION; CARBON MONOXIDE CONCENTRATION; OPTICAL GRADE FUSED SILICA;

ION IMPLANTATION;

EID: 0030353466     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-438-447     Document Type: Conference Paper

References (7)