High-frequency SAW devices fabricated by reactive ion etch technology

Proceedings of the IEEE Ultrasonics Symposium

Volumn 1, Issue , 1996, Pages 271-276

  Subramanian, Rajan ^a   Welter, Jason ^a   Chang, Rudolfo E ^a   Wright, Peter V ^a  

^a RF Monolithics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; BANDWIDTH; ELECTRODES; PLASMA ETCHING; REACTIVE ION ETCHING;

INSERTION LOSS; WET ETCHING;

ACOUSTIC SURFACE WAVE DEVICES;

EID: 0030349107     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)