Role of silicon surface in the removal of point defects in ultra-shallow junctions

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 615-617

  Sultan, A ^a   Banerjee, S ^a   List, S ^a   Rodder, M ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ION IMPLANTATION; POINT DEFECTS; SEMICONDUCTOR JUNCTIONS; TRANSMISSION ELECTRON MICROSCOPY;

ULTRA SHALLOW JUNCTIONS;

SEMICONDUCTING SILICON;

EID: 0030348977     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)