SAW characteristics of AlN films deposited on various substrates using ECR plasma enhanced CVD and reactive RF sputtering

Proceedings of the IEEE Ultrasonics Symposium

Volumn 1, Issue , 1996, Pages 299-302

  Soh, Ju Won ^a   Lee, Won Jong ^a   Park, Jang Ho ^a   Lee, Soong Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVE VELOCITY; ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; ELECTRON CYCLOTRON RESONANCE; SEMICONDUCTING FILMS; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS;

ALUMINUM NITRIDE; INSERTION LOSS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

ACOUSTIC SURFACE WAVE DEVICES;

EID: 0030348969     PISSN: 10510117     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)