Rigorous electromagnetic analysis of aerial image formation in photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 299-310

  Babin, Sergey ^a   Sheridan, John T ^a  

^a Physics and Technology Centre   (Germany)

Author keywords

Aerial image formation; Calibration standards; Diffraction gratings; Holographic recording; Photoresist

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; DIFFRACTION GRATINGS; ELECTROMAGNETIC FIELDS; HOLOGRAPHY; IMAGE PROCESSING; IMAGING TECHNIQUES; LITHOGRAPHY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY;

RIGOROUS ELECTROMAGNETIC ANALYSIS;

PHOTORESISTS;

EID: 0030316340     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240972     Document Type: Conference Paper

References (14)

1. Holographic honeycomb microlens
2. Pre-exposure for 2-D gratings in photoresist
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7. Rapid optimisation of the lithographic process window
8. Investigation of photoresist-specific optical proximity effect
9. Three dimensional profile simulation for positive photoresists
10. Practical volume holography
11. Diffraction, beauty and commerce
12. Imaging periodic surface relief structures