Evaluation of proximity effects using three-dimensional optical lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 634-639

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; FOCUSING; IMAGE ANALYSIS; MASKS;

CRITICAL DIMENSION ERRORS (CDE);

PHOTORESISTS;

EID: 0030316209     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240928     Document Type: Conference Paper

References (4)

1. Practical optical mask proximity effect correction adopting process latitude consideration
2. Mask bias in submicron optical lithography
3. A method for correction of proximity effect in optical lithography