Practical topography design for alternating phase-shifting mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 473-484

  Tanaka, Satoshi ^a   Nakamura, Hiroko ^a   Kawano, Kenji ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Alternating phase shifting mask; Dual trench structure; ED tree; Effective transmission and phase; TDFDM; Topographical effect

Indexed keywords

FINITE DIFFERENCE METHOD; IMAGE ANALYSIS; LIGHT SCATTERING; MAXWELL EQUATIONS; OPTIMIZATION; PHASE SHIFTERS;

PHASE-SHIFTING MASKS;

MASKS;

EID: 0030314756     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240919     Document Type: Conference Paper

References (13)

1. Exposure characteristics of alternate aperture phase-shifting maks fabricated using a subtractive process
2. Phase-shifting mask topography effects on lithographic image quality
3. Application of alternating phase shift mask to device fabrication
4. Pattern-dependent correction of mask topography effects for alternating phase-shifting masks
5. Analysis of nonplanar topography effects of phase-shift mask on imaging characteristics
6. Numerical solution of initial boundary value problems involving Maxwell's equations in isotropic media
7. Edge effects in phase-shifting masks for 0.25 μm lithography
8. Numerical simulation of thick line width measurements by reflection light
9. Some image modeling issues for I-line, 5X phase shifting masks
10. A rigorous and practical vector model for phase shifting masks in optical lithography
11. Intensity optimization for phase shifting masks
12. Efficient 3D phase shifting mask lithography simulation
13. Modeling high numerical aperture optical lithography