Two new methods for simulating photolithography development in 3D

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 253-261

  Helmsen, John ^a   Puckett, Elbridge Gerry ^a   Colella, Phillip ^a   Dorr, Milo ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Advection; Eikonal; Etch; Fast level set; Level set; Photolithography; Steady level set; Three dimensions; Volume of fluid

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ETCHING; HAMILTONIANS; LEVEL MEASUREMENT; PHOTORESISTS; TOPOLOGY; VECTOR QUANTIZATION; VOLUME FRACTION;

ITERATIVE LEVEL-SET ALGORITHM;

PHOTOLITHOGRAPHY;

EID: 0030313072     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240959     Document Type: Conference Paper

References (15)

1. Curvature flow and entropy conditions applied to grid generation
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4. A review of the theory, algorithms, and applications of level set methods for propagating interfaces
5. A fast marching level set method for monotonically advancing fronts
6. Characterization of positive photoresist
7. Modeling and simulation of a deep-uv acid hardening resist
8. Development of positive photoresists
9. Development of positive photoresist
10. Process modeling for photoresist development and design of DLR/sd (double-layer resist by a single development) process
11. A shock-tracking algorithm for surface evolution under reactive-ion etching