Wafer and chip deformation caused by pattern transfer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 104-112

  Imai, Akira ^a   Hasegawa, Norio ^a   Okazaki, Shinji ^a   Sakaguchi, Kouichi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Optical lithography; Overlay; Wafer deformation

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; FINITE ELEMENT METHOD; PHOTOLITHOGRAPHY; SILICON WAFERS; SUBSTRATES; THIN FILMS;

PATTERN TRANSFER; WAFER DEFORMATION;

MICROPROCESSOR CHIPS;

EID: 0030313071     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240975     Document Type: Conference Paper

References (3)