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Volumn 6, Issue , 1996, Pages 343-349

Optimizing the growth of PECVD silicon nitride films for solar cell applications using neural networks and genetic algorithms

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GENETIC ALGORITHMS; NEURAL NETWORKS; OPTIMIZATION; PLASMA SPRAYING; SOLAR CELLS;

EID: 0030308850     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article
Times cited : (2)

References (15)
  • 4
    • 0028449475 scopus 로고
    • Modeling the Properties of PECVD Silicon Dioxide Films Using Optimized Back-Propagation Neural Networks
    • June
    • Han, S., Ceiler, M., Bidstrup, S., Kohl, P., and May. G., "Modeling the Properties of PECVD Silicon Dioxide Films Using Optimized Back-Propagation Neural Networks," IEEE Trans. Comp. Pack, & Manufac. Tech., vol. 17, no. 2, June, 1994.
    • (1994) IEEE Trans. Comp. Pack, & Manufac. Tech. , vol.17 , Issue.2
    • Han, S.1    Ceiler, M.2    Bidstrup, S.3    Kohl, P.4    May, G.5
  • 5
    • 0024608092 scopus 로고
    • Low-Temperature Surface Passivation of Silicon for Solar Cells
    • Hezel, R., and Jaeger. K., "Low-Temperature Surface Passivation of Silicon for Solar Cells," J. Electrochem. Soc., vol. 136. p. 518, 1989.
    • (1989) J. Electrochem. Soc. , vol.136 , pp. 518
    • Hezel, R.1    Jaeger, K.2
  • 6
    • 0027592466 scopus 로고
    • Advantages of Plasma Etch Modeling Using Neural Networks over Statistical Techniques
    • May
    • Himmel, C., and May, G., "Advantages of Plasma Etch Modeling Using Neural Networks Over Statistical Techniques,* IEEE Trans. Semi. Manufac., vol. 6, no. 2, pp. 103-111, May, 1993.
    • (1993) IEEE Trans. Semi. Manufac. , vol.6 , Issue.2 , pp. 103-111
    • Himmel, C.1    May, G.2
  • 8
    • 0020686937 scopus 로고
    • Plasma-Enhanced CVD Silicon Nitride Antireflection Coatings for Solar Cells
    • Johnson, C., Wydeven, T., and Donohoe, K., "Plasma-Enhanced CVD Silicon Nitride Antireflection Coatings for Solar Cells," Solar Energy, vol. 31, no. 4, pp. 355-358, 1983.
    • (1983) Solar Energy , vol.31 , Issue.4 , pp. 355-358
    • Johnson, C.1    Wydeven, T.2    Donohoe, K.3
  • 9
    • 0028370346 scopus 로고
    • An Optimal Neural Network Process Model for Plasma Etching
    • Feb.
    • Kim, B., and May, G., "An Optimal Neural Network Process Model for Plasma Etching," IEEE Trans. Semi. Manufac., vol. 7, no. 1, pp. 12-21, Feb., 1993.
    • (1993) IEEE Trans. Semi. Manufac. , vol.7 , Issue.1 , pp. 12-21
    • Kim, B.1    May, G.2
  • 10
    • 0026153051 scopus 로고
    • Statistical Experimental Design in Plasma Etch Modeling
    • May
    • May, G., Huang, J., and Spanos, C., "Statistical Experimental Design in Plasma Etch Modeling," IEEE Trans. Semi. Manufac., vol. 4, no. 2, pp. 83-98, May, 1991.
    • (1991) IEEE Trans. Semi. Manufac. , vol.4 , Issue.2 , pp. 83-98
    • May, G.1    Huang, J.2    Spanos, C.3
  • 11
    • 0028507249 scopus 로고
    • Manufacturing ICs the Neural Way
    • Sept.
    • May, G., "Manufacturing ICs the Neural Way," IEEE Spectrum, vol. 31, no. 9, pp. 47-51, Sept., 1994.
    • (1994) IEEE Spectrum , vol.31 , Issue.9 , pp. 47-51
    • May, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.