Ionization-assisted deposition of Alq3 films

Thin Solid Films

Volumn 288, Issue 1-2, 1996, Pages 229-234

  Usui, H ^a   Kameda, H ^a   Tanaka, K ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

Ion bombardment; Ion plating; Luminescence; Organic substances

Indexed keywords

COMPOSITION EFFECTS; CURRENT DENSITY; DEPOSITION; ENERGY GAP; IMPURITIES; ION BOMBARDMENT; LUMINESCENT DEVICES; PHOTOLUMINESCENCE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROXYQUINOLINE ALUMINUM; INFRARED ABSORPTION SPECTRA; ION PLATING; IONIZATION ASSISTED DEPOSITION;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0030291787     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08798-6     Document Type: Article

References (13)

1. C.W. Tang and S.A. VanSlyke, Appl. Phys. Lett., 51 (1987) 913.
2. H. Usui, I. Yamada and T. Takagi, J. Vac. Sci. Technol., A4 (1986) 52.
3. H. Usui, K. Numata, H. Dohmoto, I. Yamada and T. Takagi, Mater. Res. Soc. Symp. Proc., 108 (1988) 201.
4. T. Takagi, Physics of Thin Films, Vol. 13, Academic Press, New York, 1987, Chap. 1.
5. H. Sato, personal communication, 1992.
6. A.A. Shabaka, M. Fadly, M.A. El Ghandoor and F.M. Abdel Kerim, J. Mater. Sci., 25 (1990) 2193.
7. T. Yoshida, Bull. Chem. Soc. Jpn., 53 (1980) 1327.
8. H. Schmidbaur, J. Lettenbauer, D.L. Wilkinson, G. Müller and O. Kumberger, Z. Naturforsch., 46b (1991) 901.
9. P. Addy, D.F. Evans and R.N. Sheppard, Inorg. Chim. Acta, 127 (1987) L19.
10. H. Usui, M. Naemura, H. Nakanishi, I. Yamada and T. Takagi, Proc. 18th Symp. on Ion Sources and Ion-Assisted Technology, Tokyo, June, 1984, The Research Group of Ion Engineering, Kyoto, 1984, p. 271.
11. T. Takagi, J. Vac. Sci. Technol., A2 (1984) 382.
12. J.W. Collat and L.B. Rogers, Anal. Chem., 27 (1955) 961.
13. R. Ballardini, G. Varani, M.T. Indelli and F. Scandola, Inorg. Chem., 25 (1986) 3858.