Reinvestigation of the first nucleated phase in Nb/Si multilayers

Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 180-183

  Zhang, Ming ^a   Yu, Wen ^a   Wang, W H ^a   Wang, W K ^a,b  

^a INSTITUTE OF PHYSICS   (China)

^b INTERNATIONAL CENTRE FOR MATERIALS PHYSICS   (China)

Author keywords

Deposition process; Multilayers; Transmission electron microscopy (TEM); X ray diffraction

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; NIOBIUM; NUCLEATION; SILICON; SILICON COMPOUNDS; SPUTTER DEPOSITION; THERMAL EFFECTS; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ION BEAM SPUTTERING DEPOSITION; SILICIDE;

MULTILAYERS;

EID: 0030291590     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08897-9     Document Type: Article

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