Preparation and characterization of high-quality ZnO film on silicon substrate by DC reactive magnetron sputtering

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 17, Issue 11, 1996, Pages 877-880

  Li, Jianguang ^a   Ye, Zhizhen ^a   Zhao, Binghui ^a   Yuan, Jun ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; SPUTTER DEPOSITION; THIN FILMS; ZINC OXIDE;

DIRECT CURRENT REACTIVE MAGNETRON SPUTTERING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 0030291354     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)