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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 11, 1996, Pages 5790-5795

Microhardness and strain depth profiles in nitrogen-implanted TiO2 films

(2) Fukushima, Kazunori a Yamada, Isao b

a SETSUNAN UNIVERSITY (Japan)

b KYOTO UNIVERSITY (Japan)

Author keywords

Anatase; Epitaxial TiO2; Implantation; Internal stress and strain; Interplanar spacing; Microhardness; Rutile

Indexed keywords

ANATASE; DEFECT DENSITY; INTERPLANAR SPACING; STRAIN DEPTH PROFILES;

CRYSTAL DEFECTS; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; HARDNESS; ION IMPLANTATION; NITROGEN; PHASE TRANSITIONS; SAPPHIRE; SPUTTERING; STRAIN; TITANIUM DIOXIDE; X RAY DIFFRACTION;

SEMICONDUCTING FILMS;

EID: 0030291156 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.35.5790 Document Type: Article

Times cited : (5)

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