메뉴 건너뛰기




Volumn 17, Issue 11, 1996, Pages 531-533

A high-frequency GaInP/GaAs heterojunction bipolar transistor with reduced base-collector capacitance using a selective buried sub-collector

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT COLLECTORS; ELECTRIC CURRENTS; ELECTRIC RESISTANCE; GAIN MEASUREMENT; OHMIC CONTACTS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH;

EID: 0030291121     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.541771     Document Type: Article
Times cited : (8)

References (9)
  • 1
    • 0023041702 scopus 로고
    • Improvement in AIGAs/GaAs HBT power gains with buried protonimplemented layer
    • O. Nakajima, K. Nagata, Y. Yamuchi, H. Ito, and T. Ishibashi, "Improvement in AIGAs/GaAs HBT power gains with buried protonimplemented layer," Electron Lett., vol. 22, pp. 1317-1318, 1986.
    • (1986) Electron Lett. , vol.22 , pp. 1317-1318
    • Nakajima, O.1    Nagata, K.2    Yamuchi, Y.3    Ito, H.4    Ishibashi, T.5
  • 2
    • 0021479281 scopus 로고
    • GaAs/AIGaAs heterojunction bipolar transistors with buried oxygen-implanted isolation layers
    • [2| P. M. Asbeck, D. L. Miller, R. J. Anderson, and F. H. Eisen, "GaAs/AIGaAs heterojunction bipolar transistors with buried oxygen-implanted isolation layers," IEEE Electron Device Lett., vol. 5, pp. 310-312, 1984.
    • (1984) IEEE Electron Device Lett. , vol.5 , pp. 310-312
    • Asbeck, P.M.1    Miller, D.L.2    Anderson, R.J.3    Eisen, F.H.4
  • 3
    • 0029407190 scopus 로고
    • High-performance low-base collector capacitance AIGaAs/GaAs heterojunction bipolar transistors fabricated by deep ion implantation
    • M. C. Ho, R. A. Johnson, W. J. Ho, M. F. Chang, and P. M. Asbeck, "High-performance low-base collector capacitance AIGaAs/GaAs heterojunction bipolar transistors fabricated by deep ion implantation," IEEE Electron Device Lett., vol. 16, pp. 51-513, 1995.
    • (1995) IEEE Electron Device Lett. , vol.16 , pp. 51-513
    • Ho, M.C.1    Johnson, R.A.2    Ho, W.J.3    Chang, M.F.4    Asbeck, P.M.5
  • 4
    • 0019554558 scopus 로고
    • Lacalized GaAs etching with acidic hydrogen peroxide solutions
    • D. W. Shaw, "Lacalized GaAs etching with acidic hydrogen peroxide solutions," J. Electrochem. Soc., vol. 128, p. 874-880, 1981.
    • (1981) J. Electrochem. Soc. , vol.128 , pp. 874-880
    • Shaw, D.W.1
  • 5
    • 0029342304 scopus 로고
    • Comparison of GaInP/GaAs heterostructure-emitter bipolar transistors and heterojunction bipolar transistors
    • Y. F. Yang, C. C. Hsu, E. S. Yang, and Y. K. Chen, "Comparison of GaInP/GaAs heterostructure-emitter bipolar transistors and heterojunction bipolar transistors," IEEE Trans. Electron Devices, vol. 42, pp. 1210-1215, 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , pp. 1210-1215
    • Yang, Y.F.1    Hsu, C.C.2    Yang, E.S.3    Chen, Y.K.4
  • 6
    • 0030107740 scopus 로고    scopus 로고
    • A high frequency and low noise C-doped GaInP/GaAs heterojunction bipolar transistor grown by MOCVD using TBA and TBA
    • Y. F. Yang, C. C. Hsu, and E. S. Yang, "A high frequency and low noise C-doped GaInP/GaAs heterojunction bipolar transistor grown by MOCVD using TBA and TBA," Electron. Lett., vol. 32, pp. 689-691, 1996.
    • (1996) Electron. Lett. , vol.32 , pp. 689-691
    • Yang, Y.F.1    Hsu, C.C.2    Yang, E.S.3
  • 7
    • 84939361544 scopus 로고
    • Evaluation of the factors determining HBT high-frequency perfomance by direct analysis of s-parameter data
    • D. Pehkle and D. Pavlidis, "Evaluation of the factors determining HBT high-frequency perfomance by direct analysis of s-parameter data," IEEE Trans. Microwave Theory Tech., vol. 40, pp. 2367-2373, 1992.
    • (1992) IEEE Trans. Microwave Theory Tech. , vol.40 , pp. 2367-2373
    • Pehkle, D.1    Pavlidis, D.2
  • 8
    • 3743100255 scopus 로고
    • Semi-insulating GaAs substartes
    • J. V. DiLorenzo and D. D. Khandelwal, Eds. Norwood, MA: Artech House, ch. 1
    • P. F. Lindquist and W. M. Ford, "Semi-insulating GaAs substartes," in GaAs FET Principles and Technology, J. V. DiLorenzo and D. D. Khandelwal, Eds. Norwood, MA: Artech House, 1982, ch. 1.
    • (1982) GaAs FET Principles and Technology
    • Lindquist, P.F.1    Ford, W.M.2
  • 9
    • 0025484059 scopus 로고
    • The influence of Fermi-level pinning at the GaAs substrate on HEMT threshold voltage
    • R. J. Krantz, D. C. Mayer and W. L. Bloss, "The influence of Fermi-level pinning at the GaAs substrate on HEMT threshold voltage," Solid-State Electron., vol. 33, pp. 1189-1195, 1990.
    • (1990) Solid-State Electron. , vol.33 , pp. 1189-1195
    • Krantz, R.J.1    Mayer, D.C.2    Bloss, W.L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.