Fabrication of high-quality long-fiber Bragg grating by monitoring 3.1-eV radiation (400 nm) from GeO defects

IEEE Photonics Technology Letters

Volumn 8, Issue 11, 1996, Pages 1495-1497

  Komukai, T ^a,b   Nakazawa, M ^a,b  

^a IEEE

^b NTT Access Network Service Systems Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; GAS LASERS; GUIDED ELECTROMAGNETIC WAVE PROPAGATION; LASER BEAMS; OPTICAL BEAM SPLITTERS; OPTICAL FIBERS; OPTICAL VARIABLES CONTROL; PHOTOLUMINESCENCE; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTOR DOPING; SILICA; ULTRAVIOLET RADIATION;

FIBER BRAGG GRATINGS;

DIFFRACTION GRATINGS;

EID: 0030290506     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.541561     Document Type: Article

References (3)

1. J. Martin and F. Ouellette, "Novel writing technique of long and highly reflective in-fiber gratings," Electron. Lett., vol. 30, no. 10, pp. 811-812, 1994.
2. H. N. Rourke, S. R. Baker, K. C. Byron, R, S. Baulcomb, S. M. Ojha, and S. Clements, "Fabrication and characterization of long, narrowband fiber gratings by phase mask scanning," Electron. Lett., vol. 30, no. 16, pp. 1341-1342, 1994.
3. M. Gallagher and U. Österberg, "Time resolved 3.10 eV luminescence in germanium-doped silica glass," Appl. Phys. Lett., vol. 63, no. 22, pp. 2987-2989, 1993.