Characterisation and electrical property of molten-grown CuTCNQ film material

Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 300-305

  Liu, Sheng Gao ^a   Liu, Yun Qi ^a   Wu, Pei Ji ^a   Zhu, Dao Ben ^a   Tian, He ^b   Chen, Kong Chang ^b  

^a INSTITUTE OF CHEMISTRY   (China)

^b EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Electronic devices; Thin film materials

Indexed keywords

CHARACTERIZATION; CHARGE TRANSFER; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; FILM GROWTH; FILM PREPARATION; ORGANOMETALLICS; RAMAN SPECTROSCOPY; SEMICONDUCTOR DEVICES; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET SPECTROSCOPY;

COPPER TETRACYANOQUINODIMETHANE;

THIN FILMS;

EID: 0030290306     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08879-7     Document Type: Article

References (39)

1. A.R. Elsharkawi and K.C. Kao, Phys. Chem. Soc., 18 (1977) 95.
2. V.I. Stafeev, V.V. Kuznetsova, V.P. Molchanov, S.S. Serov, V.V. Pospelov, E.I. Karakushan, S.V. Airapetyants and L.S. Gasanov, Sov. Phys. Semicond., 2 (1965) 642.
3. H. Carchano, R. Lacoste and Y. Segui, Appl. Phys. Lett., 19 (1971) 414.
4. J. Kevorkian, M.M. Labes, D.C. Larson and D.C. Wu, Discuss. Faraday Soc., 51 (1971) 1.
5. A. Szymanski, D.C. Larson and M.M. Labes, Appl. Phys. Lett., 14 (1969) 88.
6. R.S. Potember, T.O. Poohler and D.O. Cowan, Appl. Phys. Lett., 34 (1979) 405.
7. E.I. Kamitsos and W.M. Risen, Solid State Commun., 45 (1983) 165.
8. R.S. Potember, T.O. Pochler, R.C. Benson, US Patent, 4 574 366, 1986.
9. R.S. Potember, T.O. Pochler, A. Rappa, D.O. Cowan and A.N. Bloch, J. Am. Chem. Soc., 102 (1980) 3659.
10. R.S. Potember, T.O. Poohler and R.C. Benson, Appl. Phys. Lett., 41 (1982) 548.
11. R.C. Benson, R.C. Hoffman, R.S. Potember, E. Bourkoff and T.O. Pochler, Appl. Phys. Lett., 42 (1983) 855.
12. H. Hoshino, S. Matsushita and H. Samura, Jpn. J. Appl. Phys., 25 (1986) L341.
13. R.C. Hoffman and R.S. Potember, Appl. Opt., 28 (1989) 1417.
14. Z.Y. Hua and G.R. Chen, Vacuum, 43 (1992) 1019.
15. S.G. Liu, Y.Q. Liu and D.B. Zhu, Thin Solid Films, 280 (1996) 271.
16. L.R. Melby, R.J. Harder, W.R. Hertler, W. Mahler, R.E. Benson and W.E. Mochel, J. Am. Chem. Soc., 84 (1962) 3374.
17. S.G. Liu, Y.Q. Liu, P.J. Wu, H. Tian, K.C. Chen and D.B. Zhu, Chem. Mater., (1996) in press.
18. S.G. Liu, Y.Q. Liu and D.B. Zhu, Mol. Cryst. Liq. Cryst., 275 (1996) 211.
19. S.G. Liu, Y.Q. Liu, P.J. Wu and D.B. Zhu, Chem. J. Chin. Univ., 16 (Suppl. 11) (1995) 159.
20. J.J. Hoagland, X.D. Wang and K.W. Hipps, Chem. Mater., 5 (1993) 54.
21. A. Girlando, R. Bozio and C. Pecile, Chem. Phys. Lett., 25 (1974) 409.
22. J.B. Torrance, Acc. Chem. Res., 12 (1979) 79.
23. R. Bozio, A. Girlando and C. Pecile, J. Chem. Soc., Faraday Trans. II, 71 (1915) 1231.
24. M.S. Khatkale and J.P. Devlin, J. Chem. Phys., 70 (1979) 1851.
25. C. Chi and E.R. Nixon, Spectrochim. Acta Part A, 31 (1975) 1739.
26. A. Girlando and C. Pecile, Spectrochim. Acta Part A, 29 (1973) 1859.
27. T. Tekenaka, Spectrochim. Acta Part A, 27 (1971) 1735.
28. E.I. Kamitsos and W.M. Risen, Jr., J. Chem. Phys., 79 (1983) 5808.
29. S. Matsuzaki, R. Kuwata and K. Toyoda, Solid State Commun., 33 (1980) 40.
30. Y. Iida, Bull. Chem. Soc. Jpn., 42 (1969) 71.
31. E.I. Kamitsos, G.C. Papavassiliou and M.A. Karakassides, Mol. Cryst. Liq. Cryst., 134 (1986) 43.
32. R.H. Boyd and W.D. Phillips, J. Chem. Phys., 43 (1965) 2927.
33. D.L. Jeanmaire and R.P. Van Duyne, J. Am. Chem. Soc., 98 (1976) 4029.
34. S. Hiroma, H. Kuroda and H. Akamatu, Bull. Chem. Soc. Jpn., 44 (1971) 9.
35. D.A. Lowitz, J. Chem. Phys., 46 (1967) 4698.
36. C.J. Eckhardt and R.R. Pennelly, Chem. Phys. Lett., 9 (1971) 572.
37. S. Hiroma, H. Kuroda and H. Akamatu, Bull. Chem. Soc. Jpn., 43 (1970) 3626.
38. R.S. Poteraber, T.O. Poehler and D.O. Cowan, US Patent 4 507 672, 1986.
39. S.G. Liu, Y.Q. Liu and D.B. Zhu, Mol. Cryst. Liq. Cryst., 281 (1996) 229.