The growth and structure of thin oxide films on cerium ion-implanted nickel

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 27, Issue 11, 1996, Pages 3649-3661

  Czerwinski, F ^a   Szpunar, J A ^b   Smeltzer, W W ^a  

^a MCGILL UNIVERSITY   (Canada)

^b MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CERIUM; CRYSTAL MICROSTRUCTURE; FILM GROWTH; GRAIN BOUNDARIES; PARTICLE SIZE ANALYSIS; POLYCRYSTALLINE MATERIALS; RADIATION; SURFACE STRUCTURE; THIN FILMS; VACUUM APPLICATIONS;

CERIUM ION IMPLANTED NICKEL; POSTIMPLANTATION VACUUM ANNEALING; THIN OXIDE FILMS;

NICKEL;

EID: 0030290249     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02595456     Document Type: Article

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