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Volumn 382, Issue 1-2, 1996, Pages 225-231

Selection of RIB targets using ion implantation at the Holifield Radioactive Ion Beam Facility

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMS; CHLORINE; DIFFUSION; ESTIMATION; ION BEAMS; ION IMPLANTATION; RADIOISOTOPES; REFRACTORY MATERIALS; SEPARATORS;

EID: 0030290116     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(96)00631-6     Document Type: Article
Times cited : (10)

References (11)
  • 4
    • 0041319328 scopus 로고    scopus 로고
    • UNISOR, Oak Ridge Associated Universities, Oak Ridge, TN, 37831, USA
    • UNISOR, Oak Ridge Associated Universities, Oak Ridge, TN, 37831, USA.
  • 6
    • 0042822045 scopus 로고
    • The Institute of Metals, London, Ch. 1
    • See, for example, Diffusion in the Condensed State, J.S. Kirkaldy and D.J. Young (The Institute of Metals, London, 1987), Ch. 1.
    • (1987)
    • Kirkaldy, J.S.1    Young, D.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.