SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 288, Issue 1-2, 1996, Pages 224-228

Properties of furnace crystallized polysilicon films prepared by r.f. sputtering

(3) Sun, Z a Tong, K Y a Lee, W B a

a HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong)

Author keywords

Silicon; Sputtering

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CRYSTAL MICROSTRUCTURE; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; PRESSURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING POLYMERS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CRYSTALLIZED POLYSILICON FILMS; HALL MOBILITY; RADIO FREQUENCY MAGNETRON SPUTTERING;

SEMICONDUCTING SILICON;

EID: 0030289882 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)08861-X Document Type: Article

Times cited : (11)

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