Sol gel deposition of pure and antimony doped tin dioxide thin films by non alkoxide precursors

Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 22-28

  Senguttuvan, T D ^a   Malhotra, L K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Deposition process; Electrical properties and measurements; Optical properties; Tin oxide

Indexed keywords

ANNEALING; DEPOSITION; MICROSTRUCTURE; PH; SEMICONDUCTING ANTIMONY; SEMICONDUCTOR DOPING; SINTERING; SOL-GELS; TEMPERATURE; THIN FILMS; VISCOSITY;

DIP COATING METHOD; HYDROGEN PLASMA; NON ALKOXIDE PRECURSOR; TIN DIOXIDE;

TIN COMPOUNDS;

EID: 0030289749     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08921-3     Document Type: Article

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