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Volumn 289, Issue 1-2, 1996, Pages 121-128

Steady state growth conditions in ion assisted or induced planar thin film deposition

Author keywords

Deposition rate; Impurities; Ion bombardment

Indexed keywords

COMPOSITION; FILM GROWTH; IMPURITIES; ION BOMBARDMENT; IONS; MATHEMATICAL MODELS; THIN FILMS;

EID: 0030289314     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08886-4     Document Type: Article
Times cited : (2)

References (26)
  • 16
    • 0040933623 scopus 로고
    • P. Varga, G. Betz and F.P. Viehbock (eds.), Technical University Wien
    • R. Kelly, in P. Varga, G. Betz and F.P. Viehbock (eds.), Proc. Symp. on Sputtering, Technical University Wien, 1980, p. 390.
    • (1980) Proc. Symp. on Sputtering , pp. 390
    • Kelly, R.1
  • 26
    • 0042323267 scopus 로고
    • Private communication
    • M.G. McLaren and G. Carter, Private communication, 1995.
    • (1995)
    • McLaren, M.G.1    Carter, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.