Characterization of triazine derivatives on silicon wafers studied by photoelectron spectroscopy (XPS, UPS) and metastable impact electron spectroscopy (MIES)

Applied Surface Science

Volumn 103, Issue 3, 1996, Pages 221-229

  Dieckhoff, S ^a   Schlett, V ^a   Possart, W ^a   Hennemann, O D ^a   Gunster J ^b   Kempter, V ^b  

^a FRAUNHOFER INSTITUTE FOR MANUFACTURING TECHNOLOGY AND ADVANCED MATERIALS IFAM   (Germany)

^b CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CONFORMATIONS; DERIVATIVES; MATHEMATICAL MODELS; MOLECULAR ORIENTATION; PHENOLIC RESINS; SILICON WAFERS; SUBSTRATES; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CUMYLPHENYLCYANATE TRIMER; DIANDICYANATO BISPHENOL A (DCBA) PREPOLYMER; METASTABLE IMPACT ELECTRON SPECTROSCOPY;

ADHESION;

EID: 0030287971     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00567-3     Document Type: Article

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