Analysis and application of hydrogen supplying process in metal-oxide-semiconductor structures

Journal of the Electrochemical Society

Volumn 143, Issue 11, 1996, Pages 3771-3777

  Katashiro, Masahiro ^a   Matsumoto, Kazuya ^a   Ohta, Ryo ^a  

^a OLYMPUS CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANNEALING; DEPOSITION; ETCHING; HYDROGEN; METALLIZING; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SILICA; SILICON WAFERS;

HYDROGEN SUPPLYING PROCESS; WET ETCHING;

MOS DEVICES;

EID: 0030287551     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837288     Document Type: Article

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