Characteristics of a fast rise time power supply for a pulsed plasma reactor for chemical vapor destruction

IEEE Transactions on Industry Applications

Volumn 32, Issue 6, 1996, Pages 1257-1265

  Lawless, Phil A ^a,b   Yamamoto, Toshiaki ^a,b   Shofran, Sandra P ^a,b   Boss, Charles B ^a,b   Nunez, Carlos M ^a,b   Ramsey, Geddes H ^a,b   Engels, Roger L ^a,b  

^a RTI INTERNATIONAL   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

Corona discharge; Gas cleaning; Nanosecond rise time; Power supply; Pulsed plasma; Rotating spark gap; VOC destruction

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CORONA; ELECTRIC DISCHARGES; ELECTRIC IMPEDANCE; OSCILLATIONS; PLASMAS; RESISTORS;

CORONA DISCHARGE; CURRENT LIMITING RESISTOR; PLASMA GENERATION; ROTATING SPARK GAP; STORAGE CAPACITOR;

ELECTRIC POWER SUPPLIES TO APPARATUS;

EID: 0030286450     PISSN: 00939994     EISSN: None     Source Type: Journal    
DOI: 10.1109/28.556627     Document Type: Article

References (5)

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