High emittance electron gun for projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3764-3769

  DeVore, W ^a   Berger, S D ^b  

^a Etec Systems Inc   (United States)

^b Integrated Solutions Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ANODES; CATHODES; CRYSTALS; ELECTRIC CURRENTS; ELECTRON BEAM LITHOGRAPHY; FINITE ELEMENT METHOD; IMAGING SYSTEMS; OPTICAL DESIGN; OPTICAL INSTRUMENT LENSES; PROJECTION SYSTEMS; YTTRIUM COMPOUNDS;

ANGULAR INTENSITY UNIFORMITY; BEAM CURRENTS; ELECTRON PROJECTION SYSTEM; GUN EMITTANCE; GUN TESTING; LANTHANUM HEXABORIDE; PROJECTION LITHOGRAPHY; YTTRIUM ALUMINUM GARNET;

ELECTRON GUNS;

EID: 0030286146     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588664     Document Type: Article

References (2)

1. Harriott et al., J. Vac. Sci. Technol. B, these proceedings.
2. W. K. Waskiewicz, S. D. Berger, L. R. Harriott, M. Mkrtychan, S. W. Bowler, and J. M. Gibson, Proc. SPIE 2522, 13 (1995).