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Volumn 366, Issue 3, 1996, Pages 501-507
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Comparative study of the atomic hydrogen interaction with Si(110)"4 × 6×-Al and Si(111)√3 × √3-Al surfaces
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Author keywords
Aluminium; Atom solid interactions; Auger electron spectroscopy; Hydrogen; Low energy electron diffraction (LEED); Silicon; Surface structure, morphology, roughness, and topography
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Indexed keywords
AGGLOMERATION;
ALUMINUM;
ANISOTROPY;
ANNEALING;
AUGER ELECTRON SPECTROSCOPY;
DIFFUSION IN SOLIDS;
FILM GROWTH;
HYDROGEN;
LOW ENERGY ELECTRON DIFFRACTION;
MORPHOLOGY;
SURFACE ROUGHNESS;
ATOM SOLID INTERACTIONS;
SEMICONDUCTING SILICON;
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EID: 0030286029
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(96)00826-6 Document Type: Article |
Times cited : (4)
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References (16)
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