Photoluminescence from ion-beam cosputtered Si/Sio2 thin films

Solid State Communications

Volumn 100, Issue 6, 1996, Pages 403-406

  Allegrini, M ^a   Ciofi, C ^b   Diligenti, A ^b   Fuso, F ^b   Nannini, A ^b   Pellegrini, V ^c   Pennelli, G ^b  

^a UNIVERSITY OF MESSINA   (Italy)

^b UNIVERSITY OF PISA   (Italy)

^c SCUOLA NORMALE SUPERIORE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ION BEAM LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; QUANTUM ELECTRONICS; SEMICONDUCTING SILICON COMPOUNDS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON SUBSTRATES; FILAMENTARY STRUCTURES; ION BEAM SPUTTERING SYSTEM; LIGHT EMITTING MATERIALS;

SEMICONDUCTING FILMS;

EID: 0030284118     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(96)00422-X     Document Type: Article

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