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Volumn 288, Issue 1-2, 1996, Pages 90-94

Electrodeposition of copper-indium alloy under diffusion-limiting current control

Author keywords

Copper; Deposition process; Electrochemistry; Indium

Indexed keywords

COMPOSITION EFFECTS; DIFFUSION IN SOLIDS; ELECTRIC CURRENT CONTROL; ELECTRODEPOSITION; MORPHOLOGY; SEMICONDUCTING SELENIUM; STOICHIOMETRY; THIN FILMS;

EID: 0030284088     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08817-7     Document Type: Article
Times cited : (16)

References (22)
  • 22
    • 0041824151 scopus 로고    scopus 로고
    • JCPDS Data Base, Card No. 35-1150 (unindexed peaks), JCPDS, Swarthmore, PA
    • JCPDS Data Base, Card No. 35-1150 (unindexed peaks), JCPDS, Swarthmore, PA.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.