Monitoring multistage integrated circuit fabrication processes

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 4, 1996, Pages 495-505

  Rao, Suraj ^b   Strojwas, Andrzej J ^a,c   Lehoczky, John P ^a,c   Schervish, Mark J ^c  

^a IEEE

^b TEXAS INSTRUMENTS   (United States)

^c CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; MATHEMATICAL MODELS; MONITORING; OBSERVABILITY; PROBABILITY; SPECIFICATIONS; STATISTICAL PROCESS CONTROL;

AVERAGE RUN LENGTH; BAYESIAN MONITOR; MULTISTAGE MANUFACTURING PROCESSES; PROCESS MONITORING SYSTEM;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0030284076     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.542165     Document Type: Article

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