Merit functions for lithographic lens design

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3714-3718

  Progler, Christopher J ^a   Byrne, Dale M ^b  

^a TEXAS INSTRUMENTS   (United States)

^b UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; FAST FOURIER TRANSFORMS; GEOMETRICAL OPTICS; IMAGE QUALITY; INTEGRATION; LENSES; MATHEMATICAL MODELS; OPTIMIZATION; PHOTOLITHOGRAPHY; POLYNOMIALS; WAVEFRONTS;

CRITICAL DIMENSION; GEOMETRICAL RAYTRACING; IMAGE SIMULATION; LITHOGRAPHIC LENS; LITHOGRAPHIC MERIT FUNCTIONS;

OPTICAL DESIGN;

EID: 0030284001     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588654     Document Type: Article

References (14)

1. K. Toh and A. Neureuther, Proc. SPIE 772, 202 (1987).
2. J. Gortych and D. Williamson, Proc. SPIE 1463, 368 (1991).
3. J. Connors, T. Kos, R. Pack, and B. Smith, Proc. SPIE 1927, 494 (1993).
4. A. Marechal, Rev. d'Opt. 26, 257 (1947).
5. C. Mack, The Future of Optical Lithography (FINLE Technologies, Austin, Texas, 1994).
6. C. Willliams and O. Becklund, Introduction to the Optical Transfer Function (Wiley, New York, 1989).
7. R. Kingslake, Lens Design Fundamentals (Academic, New York, 1978).
8. H. H Hopkins, Proc. SPIE 46, 2 (1974)
9. D. Cole, E. Barouch, and U. Hollerbach, Jpn. J. Appl. Phys. 31, 4110 (1992).
10. H. H. Hopkins, SPSE International Conference on Image Analysis and Evaluation (Society of Photographic Scientists and Engineers, Toronto, Ontario, Canada, 1976), pp. 114-122.
11. M. Yeung, D. Lee, R. Lee, and A. Neureuther, Proc. SPIE 1927, 452 (1993).
12. T. Brunner and R. Ferguson, SPIE Proc. Microlithog. IX, 198 (1996).
13. Prolith/2 by Finie Technologies, Austin, Texas.
14. T. Jamieson, Optimization Techniques in Lens Design (Elsevier, New York, 1971).