Structure and bonding of organosilicon compounds containing silicon-silicon and silicon-germanium bonds: An X-ray absorption fine structure study

Canadian Journal of Chemistry

Volumn 74, Issue 11, 1996, Pages 2229-2239

  Xiong, Jian Z ^a   Jiang, Detong ^a,b   Dixon, Craig E ^a   Baines, Kim M ^a   Sham, T K ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

EXAFS; Organosilicon; Si Ge bond length; XAFS

Indexed keywords

ATOMS; CHEMICAL BONDS; CRYSTAL STRUCTURE; GERMANIUM; MOLECULES; SILICON; X RAY SPECTROSCOPY;

ORGANOSILICON; SILICON-GERMANIUM BOND LENGTH; SILICON-SILICON BOND LENGTH; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;

ORGANOMETALLICS;

EID: 0030283974     PISSN: 00084042     EISSN: None     Source Type: Journal    
DOI: 10.1139/v96-251     Document Type: Article

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