Effects of bar length on switching field of nanoscale nickel and cobalt bars fabricated using lithography

Journal of Applied Physics

Volumn 80, Issue 9, 1996, Pages 5205-5208

  Kong, Linshu ^a   Chou, Stephen Y ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT; COERCIVE FORCE; ELECTRIC FIELDS; ELECTRON BEAM LITHOGRAPHY; MAGNETIZATION; MICROSCOPIC EXAMINATION; NICKEL; SWITCHING;

BAR LENGTH; MAGNETIC BARS; MAGNETIC FORCE MICROSCOPY; MAGNETOSTATIC ENERGY;

MAGNETIC MATERIALS;

EID: 0030283835     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363504     Document Type: Article

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