Analysis and Modeling of SIPOS Deposition in a Hot Wall Tubular Reactor. Part I: Review of Previous Work and Experimental Study

Chemical Vapor Deposition

Volumn 2, Issue 6, 1996, Pages 255-263

  Fayolle, Francine ^a   Couderc, Jean Pierre ^a   Duverneuil, Patrick ^a  

^a LABORATOIRE DE GÉNIE CHIMIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; MASS TRANSFER; NITROGEN OXIDES; OXYGEN; PHOSPHORUS; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; REACTION KINETICS; SEMICONDUCTING SILICON; SILANES; SILICA; THERMODYNAMICS;

NITROUS OXIDE; POLYSILICON; SEMI INSULATING POLYCRYSTALLINE SILICON; SILICON OXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 0030283697     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19960020610     Document Type: Article

References (32)

1. K. F. Jensen, D. B. Graves, J. Electrochem. Soc. 1983, 130, 1950.
2. M. Coltrin, R. Kee, J. Miller, J. Electrochem. Soc. 1984, 131, 425.
3. C. Azzaro, P. Duverneuil, J. P. Couderc, Int. Chem. Eng. 1994, 34, 59.
4. H. Mochizuki, T. Aoki, H. Yamoto, M. Okayama, M. Abe, T. Audo, J. Appl. Phys. 1976, 15, 41.
5. M. Hamasaki, T. Adachi, S. Wakayama, M. Kikuchi, J. Appl. Phys. 1978, 49, 3987.
6. A. M. Goodman, G. Harbeke, E. F. Steigmeier, Proc. 14th Int Conf. on Physics of Semiconductors, Institute of Physics, 1978, p. 805.
7. T. Matsushita, N. Oh-Uchi, H. Yamoto, Appl. Phys. Lett. 1979, 35, 549.
8. R. Hezel, K. Jaeger, J. Electrochem. Soc. 1989, 136, 518.
9. P. R. Westmoreland, J. B. Howard, J. P. Longwell, A. M. Dean, AI-ChE J. 1986, 52, 1971.
10. J. H. Thomas III, A. M. Goodman, J. Electrochem. Soc. 1979, 126, 1766.
11. W. R. Knolle, H. R. Maxwell, J. Electrochem. Soc. 1980, 127, 2254.
12. M. L. Hitchman, J. Kane, J. Cryst. Growth 1981, 55, 485.
13. M. L. Hitchman, A. E. Widmer, J. Cryst. Growth 1981, 55, 501.
14. A. J. Learn, R. B. Jackson, J. Electrochem. Soc. 1985, 132, 2975.
15. R. V. Prasad, F. A. Selim, D. D. Chung, Mater. Lett. 1986, 4, 71.
16. M. Nakamura, Y. Mochizuki, K. Usami, Y. Itoh, T. Nozaki. J. Electrochem. Soc. 1985, 132, 482.
17. A. E. Widmer, G. Harbeke, L. Krausbauer, E. F. Steigmeier, J. Electrochem. Soc. 1986, 133, 1980.
18. C. H. Lam, K. Rose, Mater. Res. Soc. Sym. Proc. 1989, 131, 281.
19. A. Yeckel, S. Middleman, K. Hochberg, J. Electrochem. Soc. 1989, 136, 2038.
20. D. Jaume, Thèse de doctorat, Toulouse 1990.
21. C. J. Giunta, J. D. Chapple-Sokol, R. J. Gordon, J. Electrochem. Soc. 1990, 137, 3237.
22. B. S. Meyerson, J. M. Jasinski, J. Appl. Phys. 1987, 61, 785.
23. P. Duverneuil, J. P. Couderc, J. Electrochem. Soc. 1992, 139, 296.
24. A. Tounsi, Thèse de doctorat, INP Toulouse 1995.
25. C. J. Giunta, R. J. McCurdy, J. D. Chapple-Sokol, R. J. Gordon, J. Appl. Phys. 1990, 67, 1062.
26. S. K. Loh, D. B. Beach, J. S. Jasinski, Chem. Phys. Lett. 1990, 169, 55.
27. F. Fayolle, Thèse de doctorat, Toulouse 1991.
28. M. Coltrin, R. Kee, G. Evans, J. Electrochem. Soc. 1989, 136, 819.
29. S. W. Benson, Thermochemical Kinetics Method for the Estimation of Thermodynamical Data and Rate Parameters, Wiley-Interscience, New York 1976.
30. C. W. Gear, Numerical Initial Value Problems in Ordinary Differential Equations, Prentice-Hall, Englewood Cliffs, NJ 1971.
31. M. Gueye, E. Scheid, P. Duverneuil, D. Bielle-Daspet, J. P. Couderc, J. Phys. (Paris) 1991, 1, C2-63.
32. R. Buss, P. Ho, W. Breiland, M. Coltrin, J. Appl. Phys. 1988, 63, 2808.