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Volumn 382, Issue 1-2, 1996, Pages 357-360
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The Rossendorf 3 MV tandetron: A new generation of high-energy implanters
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Author keywords
[No Author keywords available]
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Indexed keywords
ION BEAMS;
ION IMPLANTATION;
ION SOURCES;
IONS;
SURFACE TREATMENT;
MATERIALS MODIFICATION;
TANDETRON;
PARTICLE ACCELERATORS;
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EID: 0030283430
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-9002(96)00393-2 Document Type: Article |
Times cited : (33)
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References (10)
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