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Volumn 382, Issue 1-2, 1996, Pages 357-360

The Rossendorf 3 MV tandetron: A new generation of high-energy implanters

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; ION IMPLANTATION; ION SOURCES; IONS; SURFACE TREATMENT;

EID: 0030283430     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(96)00393-2     Document Type: Article
Times cited : (33)

References (10)
  • 4
    • 0041819797 scopus 로고    scopus 로고
    • private communication
    • P. Giebels, HVEE, private communication.
    • HVEE
    • Giebels, P.1
  • 9
    • 4243465815 scopus 로고
    • 4th Int. Conf. on microprobe technology and applications
    • Shanghai, China, in press
    • F. Herrmann and D. Grambole, 4th Int. Conf. on Microprobe Technology and Applications, Shanghai, China, 1994, Nucl. Instr. and Meth. B, in press.
    • (1994) Nucl. Instr. and Meth. B
    • Herrmann, F.1    Grambole, D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.