Study on elliptical polarization illumination effects for microlithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4193-4198

  Jeon, Seong Ho ^a   Cho, Bae Doo ^a   Lee, Kyeong Woon ^a   Lee, Sung Muk ^a   Baik, Ki Ho ^b   Ahn, Chang Nam ^b   Yim, Dong Gyu ^b  

^a Seoul National University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; FOURIER TRANSFORMS; GRAPHIC METHODS; INTEGRATION; LIGHT POLARIZATION; LIGHTING; MASKS;

CIRCULAR POLARIZATION; ELLIPTICAL POLARIZATION ILLUMINATION; ELLIPTICAL POLARIZATION ILLUMINATION EFFECTS; ELLIPTICITY; MICROLITHOGRAPHY; TRANSMISSION CROSS COEFFICIENT; VECTOR IMAGE CODE;

LITHOGRAPHY;

EID: 0030283428     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588619     Document Type: Article

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