Reliability of a focused ion beam repair on digital CMOS circuits

Microelectronics Reliability

Volumn 36, Issue 11-12 SPEC. ISS., 1996, Pages 1787-1790

  Van Camp, R ^a   Van Doorselaer, K ^a   Clemminck, I ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTROMIGRATION; INTEGRATED CIRCUIT LAYOUT; ION BEAM LITHOGRAPHY; DIGITAL INTEGRATED CIRCUITS; RELIABILITY;

DIGITAL COMPLEMENTARY METAL OXIDE SEMICONDUCTOR (CMOS) CIRCUITS; FOCUSED ION BEAM REPAIR; FOCUSED ION BEAM (FIB) TECHNOLOGY;

DIGITAL INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS;

EID: 0030274011     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/0026-2714(96)00198-9     Document Type: Article

References (5)

1. J. Melngailis, C.R. Musil, E.H. Stevens, M. Utlaut, E.M. Kellog, R.T. Post, M.W. Geis and R.W. Mountain, : "The Focused Ion Beam as an Integrated Circuit Restructuring Tool", J. Vac. Sci Techn. B4, p. 176 (1986).
2. K. Van Doorselaer, M. Van den Reeck, L. Van den Bempt, R. Young, J. Whitney : "How to Prepare Golden Devices Using Lesser Materials", Proc. Int. Symp on Testing and Failure Analysis ISTFA '93, p. 405.
3. J.L. Lee, D.H. Yao : "Electromigration Study of Focused Ion Beam Modified Metal Lines", Proc. Int. Symp on Testing and Failure Analysis ISTFA '95, p. 241
4. K. Van Doorselaer, P Van der Heijden, J. Verweij : "Focused Ion Beam for Failure Analysis, a Case Study", Proc. ESREF 1991.
5. David R. Lide : "CRC Handbook of Chemistry and Physics", 75th edition, 1995 CRC Press Inc, p. 12-172 through 12-177.